Molecular Imprints, Inc (MII) develops and manufactures nano-imprint lithography systems for high resolution and for 3-dimensional pattern replication. MII has commercialised the unique S-FIL technology in the IMPRIO™ product range. S-FIL™ is a simple 5-Step Process using a template or mold in a step and repeat process. The S-FIL™ nano-imprint process uses room temperature, low pressure and has demonstrated sub-20 nanometer resolution with precise overlay alignment.
 S-FIL: A simple 5-Step Process
Imprinting Process
Standart Pattern Transfer Lithography
Ultra High Resolution Imprints
Multi-Layer and 3-Dimensional Imprints
Product Features of IMPRIO™ Lithography Systems
UV-Curable, Step and Repeat Imprinting Capability
Affordable Lithography
SUB-50 Nanometer Resolution with Superior Critical Dimension Control
Multi-Layer and 3-Dimensional Imprinting
Application Manager™ Software for Easy Tool Operation
SUB-Micron Overlay Alignment Capability |