| | The IMPRIO™ range of lithography systems utilizes S-FIL™, which is a bi-layer lithography technique where a low viscosity, UV-curable liquid is dispensed in droplets onto an underlying standard organic planarisation layer, enabling imprinting on a wide range of semiconductor device layers. Unlike whole wafer thermal imprinting, the IMPRIO™ step and repeat process has the flexibility to support up to 8 inch wafers, with a low cost single-size template. Furthermore, since the IMPRIO™ systems operate at very low imprint pressures, fragile substrates like GaAs, InP, or glass can also be imprinted. The IMPRIO™ systems can imprint up to a 10 mm square field or a 14 mm diameter round field during its step and repeat process. |