IMPRIO™ 55
| System Configuration |
- Wafer sizes (in inches): up to 8", SEMI standard. Others available by request
- Stage type: Multi-axies cross roller bearings, optical encoder metered, linear motor drive
- Vibration control: Passive, elastomeric iso-damp
- Computer type: Windows PC, touch screen interface
- Wafer handling: Semi-automatic
- Template loading: Semi-automatic, vacuum held
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| Illumination Specifications |
- Exposure uniformity: ±20%
- Exposure time: <60 seconds per imprint field
- Lamp type: 100 Watt Hg-Xe, commercially available lamp
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| Template Specifications |
- Size at pattern generation/inspect: 6" x 6" x 0.250" quartz; 0.5 mm flat
- Size, imprint ready: 65 mm x 65 mm x 0.250",
10 mm x 10 mm or 14 mm
- Diameter pedestal
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| General Specifications / Facilities |
- Wafer-on-chuck placement: ±200 mm
- Power: 120 V, 20 Amp, single phase
- CDA and N2: 300 kPa, 15 slpm and 10 slpm, respectively
- Vacuum: -80 to -101 kPa
- Foot Print: 1.3 m x 1.2 m
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| Alignment Specifications |
- Alignment: <1 mm, 1σ using proximity alignment (X, Y, and Rotation)
- Operator controlled: Through the Template (TTT), site-by-site
- Alignment spectrum: 500-650 nanometers, TTT direct viewing system
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| Imprint Specifications |
- Maximum field size: 10 mm x 10 mm full active print area
- Minimum field size: 5 mm x 5 mm active print area
- Exposure spectrum: 330 nm - 400 nm, broadband, i-line
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