CrossBeam® Workstations
Products
AURIGA® -
Information Beyond Resolution
New CrossBeam® Workstation (FIB-SEM)
NVision 40 & Argon Ion Beam Option
The powerful combination of FIB and GEMINI® Column. Optional the unique supreme milling capability with Argon Ion Beam
NEON® 60
The ultimate research tool
More Information
NanoPatterning Engine
Brain Mapping
GEMINI® Technology
Find out more about the unique & innovative electron optical system
System Features
Current Articles
Application Notes
Product Information
CrossBeam® Video Tour
Brochures
He-Ion, SEM, FE-SEM, FIB, TEM and NTS Division Literature
News
2009-10-01:
Analysis of Shale Rock
Carl Zeiss Enables Nanoscale Analysis of Hydrocarbon Deposits in Shale Rock
NanoPatterning Engine for CrossBeam Workstations
Flexible user Interface for structuring with 16 bit accuracy

Introduction Video
Teaser_AURIGA_Product-Launch-Video
GEMINI_Teaser_190x102
GEMINI® Technology
Find out more about the unique & innovative electron optical system

Contact
The Carl Zeiss CrossBeam® Workstations are covering a complete range of unique instruments.
Starting from the unique AURIGA platform approach that allows to individually tailor systems to customer applications in daily analytical work, sample preparation and high performance imaging and ranging to the award winning NVision40 Workstation for highest demands in imaging and unparalleled ion beam performance.

The unique CrossBeam® Workstations are combining the unequalled imaging power of the proprietary GEMINI® field emission technology with the sophisticated high performance focussed ion beam column into one extraordinary powerful system. The superior eucentric stage, together with a sophisticated compact multi-channel gas injection system makes the CrossBeam® Workstations to ultimate analysis and inspection tools. The unique live imaging capabilities over the entire magnification range during FIB operation give full control when working on critical samples. A range of options assures that every CrossBeam® Workstation can be configured for demanding applications.