He-Ion Microscope
Defect Review Applications
The ITRS 2005 Yield Management Roadmap shows a lot of red brick walls in the near years for defect review. Some particular areas where solutions are lacking include ultimate resolution and material identification. The ORION® PLUS helium ion microscope offers promise for both of these difficult areas.

The ultimate resolution of the helium ion microscope should prove to be much better than that of an SEM due to its higher brightness source and lower diffraction effects. Sub-nanometer resolution should be possible with a helium ion microscope.

The standard for material identification today is energy dispersive X-ray analysis. This technique suffers from a lack of resolution as the volume being analyzed can often be much larger than the defect itself. The ORION® PLUS helium ion microscope can collect and analyze backscattered helium ions, much like in Rutherford Backscattered Spectroscopy, and determine the different materials in the sample with submicron resolution.
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Semiconductor Applications

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