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 | | GEMINI® Electron Optics
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Schematic view of the GEMINI® column.
With minimum mechanical degrees of freedom the system is designed formaximum ease of use. |
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Superb imaging and analysis
Imaging of modern compound materials requires an electron optical system capable of delivering high resolution images with excellent contrast even at very low beam energies. The advanced optical system design of the GEMINI® meets this requirement with its unique beam booster approach that provides decreasing lens aberration coefficients with decreasing beam energy.
Imaging of magnetic materials, such as ferromagnetic steel or rare
earths, can be easily achieved with an objective lens designed for
minimum magnetic field at the sample. High voltage material characterization by EDS, EBSD or other advanced techniques is
based on a system designed for analytics. With its short analytical
working distance of down to 5 mm and an optics design that provides optimised beam current conditions and hence signal to noise ratios, the system is ideally suited for any kind of material investigations.
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| Magnetic field leakage of the GEMINI® lens compared to a traditional single pole lens design. A minimum magnetic field is required for the high resolution investigation of magnetic materials and undistorted ion beam operation. |
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| The beam booster advantage: decreasing lens aberrations with decreasing beam voltage for high resolution imaging at very low landing energies. |
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Ease of use by design
Being able to easily adjust parameters such as beam voltage and field of view is key in optimizing an instrument for highest resolution and contrast imaging. Faster time to result can be achieved with an optical system design providing truly continuous adjustment of magnification, no tedious re-alignments after a change in beam energy, and a system control that automatically provides optimized values for beam aperture selection.
Instant topography and composition
Topographical and compositional information is obtained simultaneously based on the unique detector architecture that allows parallel detection of secondary and backscattered electrons. Two secondary electron detectors – chamber mounted and in-lens – guarantee maximum topography information for samples of various heights and shapes. The optional EsB detector provides highest material contrast with energy-filtered detection of backscattered electrons. | |
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