Essential Specification
NVision 40

SEMFIB
ResolutionGemini Column
1.1 nm @ 20 kV
2.5 nm @ 1 kV
SIINT 100 mm zeta FIB column
4nm @ 30kV
Magnification30x - 900kx475x - 500kx
Probe Current4 pA - 20 nA< 0.1 pA - 45 nA
Acceleration Voltage
low voltage option
0.1 - 30 kV5 - 30 kV
1 - 5 kV (option)
EmitterThermal field emission typeGa liquid metal ion source
Gas Injection SystemFour channel single injector GIS system for
- up to two different solid state precursors and
- up to four different gaseous or liquid precursors on individually mass flow controlled gas lines.

Wide range of precursor options including W, Pt, C, and silicon oxide insulator deposition as well as precursors for enhanced or selective materials etching.

Stage6-axis super eucentric, all motorized stage.
Motion range X, Y = 100mm
Z = 43mm
Z’ = 10mm
Tilt = -10° to 60°
Rotation = 360° continuous
Detectors
In-column:EsB detector with filtering grid for BSE detection,filtering grid voltage 0 to - 1500V.
In-lens:High efficiency annular type SE detector
Chamber:Everhart Thornley type SE detector 2 chamber IR-CCD cameras 4Q BSE detector (optional) GEMINI® multimode BF/DF STEM detector (optional)
Chamber
Size:330 mm (D) x 266 mm (H)
Load lock: 100 mm manual general purpose load lock with two specimen exchange positions.
7 additionally available ports for various options including STEM, 4QBSD, EBSD, EDX detectors, and sample manipulation systems.
Image Acquisition and Image Display
Resolution:from 512x 384 to 3072 x2304 pixel
Processing:pixel averaging, frame/line averaging and integration
System ControlIntegrated SmartSEMTM user interface based on WindowsXP® operating system, controlled by mouse, keyboard, joystick and control panel.
Space requirementRecommended footprint: 2.30 m x 2.70 m
Recommended working area: 2.70 m x 3.80 m