| | Large specimen variable pressure FESEM
The SUPRA™ 60VP is the variable pressure version of the SUPRA™ 60. With its large cylindrical chamber, refined super eucentric 6-axes motorised stage, 8" integrated airlock and added variable pressure capabilities this instrument offers the perfect solution for full wafer and semiconductor applications. It is equally useful for users who need to image a variety of non-conducting sample types. The SUPRA™ 60VP offers the ability to image non-conducting specimens, like coated glass lenses, PCB's, ceramic parts and hard-coated tools without specimen coating, therefore minimising preparation time and increasing throughput.
Key Features
- Ultra high resolution over the complete voltage range: 1.0 nm @ 15kV, 1.7 nm @ 1 kV
- Superior resolution in VP mode: 2.0 nm @ 30 kV
- Minimal specimen preparation for imaging and X-ray analysis
- High efficiency In-lens detector for clear surface specific SE imaging
- Short analytical working distance of 8.5 mm for simultaneous high resolution imaging and X-ray analysis
- Large sample throughput with integrated 8'' airlock
- Easy operation through Windows® XP based SmartSEM™ control software
 Essential Specification
Contact
Carl Zeiss NTS GmbH, Oberkochen
Phone: +49 7364 20 4488
Fax: +49 7364 20 4343
 Inquiry
 info-nts@smt.zeiss.com
 www.smt.zeiss.com/nts |