 | | Semiconductor International’s 2005 Editors’ Choice Best Product Award goes to the innovative Mask Qualification tool AIMS™ fab 193 plus. The tool optically emulates and analyses the printability of mask patterns, defects, or defect repair quality by selecting stepper equivalent optical conditions at 193 nm. AIMS™ is uniquely established as an industry standard for actinic mask qualification.
By this, a Carl Zeiss SMT AG division wins this prestigious award for the second year in a row. In 2004 Nano Technology Systems Division of Carl Zeiss SMT was awarded for its 1540XB CrossBeam® and now Semiconductor Metrology Systems Division with its AIMS™ products. This shows a strong confirmation of the Carl Zeiss SMT product strategy focusing on leading-edge technology products.
The prize will be awarded in a ceremony July 13 in San Francisco during Semicon West show to the 20 excellent products in semiconductor manufacturing for 2005. |