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| Critical Dimension Control |
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CDC200™ enables both Mask Makers and IC Manufacturers to control their local Critical Dimensions (specific mask region) and significantly improve CD Uniformity across masks (entire mask) and wafers.
Utilizing a proprietary Shade-In Element™ technology, CDC200™ changes the transmission on photomasks employing a femto-second laser.
The CDC200 is enabling technology for:
Mask Makers
- Tune your masks to meet required CD specifications and for optimal performance
- Yield improvement and fast turn-around on all mask types
- Achieve advanced CD Uniformity specifications
- Leverage existing installed mask manufacturing equipment
- Postpone purchasing additional advanced writing and etching tools
IC Manufacturers
- Improve your Lithography Process Window (PW) and overall productivity
- “Pellicle on” CD Uniformity improvement
- Improve yield on any targeted mask level: dry, immersion, double patterning lithography
- Improve chip binning: higher speed, lower leakage, etc.
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