Optics
Wavelength: 248 nm, 365 nm
Numerical aperture (NA) range: 0.30 - 0.90 in 0.01 steps, sigma aperture range: 0.3 - 1.00 in 0.01steps
Illumination
Light source: Hg-Xe 100W, 1000h lifetime
System Laser Class: Class 1
Off-axis patterns: Annular (1:3, 2:3, 1:2), quadruple, quasar, dipole and customer specific designs
Cameras
High sensitive DeepUV camera with 1317 x 1035 pixel CCD array with pixel size of 6.8 µm x 6.8 µm, 12 bit gray level resolution.
For overviewing in transmitted and reflected light: UV camera for i-line and visible light with 752 x 582 CCD array.
Monitor
18" High resolution flat panel
Scanning stage
Travel range in x/y: 230 x 230 mm
Resolution (maximum): 100 nm
Mask holder: 5", 6" and 7"
Masks
Sizes: 5" (90 mil), 6" (120 mil, 250 mil), 7" (250 mil) and 9" (350 mil)
Types: BIN, PSM, OPC and combinations there of, with or w/o pellicle
Environment
Clean room conditions: ISO class 6 (Fed. Standard 209E class 1000) or better
Inside system: ISO class 3 (Fed. Standard 209E class 1)
Power
Voltage: 110 V - 240V
Frequency: 50/ 60 Hz
Power rating: 1150 W
Dimension
1735 x 1213,
including clearance 2135 x 1613.
Weight: Main system: 450 kg, Electronic Rack: 100 kg
Options
Off-axis illumination pattern.
Defect-file-transfer KLA, Lasertech, Orbot.
For system with automated maskhandling and ISO3
minienvironment.  AIMS™ fab plus technical data
Measurement Objective Lito 10x.
AIMS™ Software
Software operating under Windows NT.
Office version available.
System Control and Image Acquisition:
Selection of wavelength, illumination type, aperture control (NA and sigma), automated alignment capability, mask positioning including review capability, focus control, video autofocus, camera control, image capture, image normalization through clear field capture, single image mode and through-focus mode.
Data Analysis:
Intensity profiles, contour plots, linewidth versus threshold plots, linewidth versus defocus plots, exposure versus defocus plots, 3D intensity plot, histogram, 2 image comparison.
Anti Vibration
Vibration damping system; facility requirements: at ground level less than 1µm amplitude in the range 0.1- 20 Hz, 2 µm 20 Hz - 100 Hz.
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