The annual SPIE/BACUS Symposium is the premier worldwide technical conference and exhibition for the photomask industry. Carl Zeiss SMS will present its latest results in the field of mask qualification, mask repair & tuning, metrology and mask monitoring.
Donīt miss our technical presentations!
| Place & Date | Presentations |
Tuesday 15 Sept
Session 3: Defect Inspection & Repair
1:40 - 3:40pm | Challenging defect repair techniques for maximizing
mask repair yield
 Download Abstract |
Session 3: Defect Inspection & Repair
1:40 - 3:40pm | Expanding the lithography process window (PW) with
CDC technology, Powerchip Semiconductor Corp. Taiwan, Carl Zeiss SMS GmbH
Download Abstract |
Session 6: Nano Imprint & Patterned Media Technology II
1:20 - 3:00pm | High-resolution e-beam repair for nano-imprint templates, IMS Stuttgart, Carl Zeiss SMS GmbH
Download Abstract |
Poster Session / Inspection & Repair
6:30 - 8:00pm
| AIMS mask qualification for 32nm node
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New analysis tools and processes for mask repair
verification and defect disposition based on AIMS
images
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Wednesday 16 Sept
Session 12: Metrology II
3.30-5.30pm | In-die metrology on photomasks for low-k1 lithography
Download Abstract |
 top |  Official Website
Conference
14-17 September, 2009
Exhibition
15-16 September, 2009
Place
Monterey Marriott & Conference Centre, Monterey / CA; USA |