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Galileo™
High Sensitivity DUV Transmission Metrology System for Mask and Lithography Applications |
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Shrinking device geometries present a continuous challenge for photomask and IC manufacturers alike.
The profile of mask transmission measurement and monitoring has been raised in recent years with the advent of so-called progressive defects that can with time and usage have a dramatic effect upon CD non-uniformity across the photomask.
The Galileo™ system offered by Carl Zeiss provides high speed, high resolution DUV transmission monitoring of photomasks at both the blank manufacturer for quality control and within the wafer fab, where transmission degradation can be monitored against exposure usage. | |
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