The novel AIMS™ 45-193i offering a maximum NA of 1.4 meets the stringent requirements for advanced photomask evaluation for the 45 nm node.
Based on an entirely new platform the system enables the emulation of 193 nm immersion scanners.
Main system improvements of the AIMS™ 45-193i include polarised illumination and a novel vector effect emulation capability which allows the study of rigorous polarisation effects as they appear from reticles and the scanner technology itself.
The system achieves specifications enabling emulation of upcoming scanner generations already today.
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Features & Benefits
New Beam Path
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