E- Beam Induced Chemical Reactions
Electron beam induced chemical reactions are exploited for etching and deposition of mask material. A suitable precursor gas is dispensed through a nozzle near to the focused electron beam. The precursor gas molecules adsorb at the substrate surface, and a reaction is induced by the electron beam. This reaction leads to either a deposition caused by fragmentation of precursor gas molecules or to an etching of the substrate material reacting into volatile products.
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| Deposition of dedicated material | Etching of dispensable material |
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