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Reticle CDU qualification and monitoring
Galileo® is an effective metrology tool for monitoring mask CD Uniformity by measuring the mask transmission. It can be utilized for capturing any mask induced dose changes directly effecting CD Uniformity.
The Galileo® concept is finding global CD uniformity effects on the mask. The system simply alarms when transmission/CD uniformity is out of specification boundaries.
Since Galileo® measures mask CD uniformity through pellicle with high throughput and repeatability, it is perfectly suited for periodic mask CDU monitoring in wafer fabs.
Input for scanner exposure corrections
Galileo® can be utilized to generate scanner correction input (e.g. ASML Dose Mapper) to improve the wafer CD uniformity whenever it becomes necessary to maintain the wafer yield.
The dedicated tool configuration allows to have results with highest possible turnaround- time to manufacture. | |
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