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| Unique Products with high Synergy Potential |
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Carl Zeiss provides a self-contained yield enhancement solution for the mask making industry. Combining the unique AIMS™ system and the worldwide first E-Beam Mask Repair Tool MeRiT™ allows for manufacturing defect-free photomask with optimum yield.
AIMS™ is used for reticle defect analysis and printability analysis of phase defects based on optical stepper emulation.
MeRiT® as Multi Generation system offering superior resolution and damage-free reticle repair using E-beam technology.
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