| Features | Benefits |
| NA up to 1.4 | Enabling the emulation of future 193 nm immersion scanners for 45 nm node |
| Mask face down | Scanner equivalent beam path |
| Scanner equivalent polarisation settings (linear & tangential) | Setting of all types of scanner illumination |
| Full vector effect emulation capability | Allows the emulation of vector effects induced by high NA imaging |
| Multi off-axis pattern illumination | Quick and easy exchangeable off-axis illumination device for 20 patterns |
| New beam homogenizer | Ensures contrast fidelity and CD uniformity |
| Piezo z-drive | Highly precise best focal plane determination and repeatability |
| Special system housing | Temperature control
Acoustical isolation
Contamination risk reduction |
| Vibration isolation | Ensures very tight transmission and CD repeatability |
| High accuracy stage | Allows for precise mask positioning |
| Separated beam paths VIS/DUV | Higher optics stability at advanced and improved optical settings |
| Overview camera | Quick and easy mask navigation and alignment |
| Automated alignment | Saving of operator and tool time at high accuracy |