In the area of Photomask Technologies
Carl Zeiss SMS is pleased to share with you the following list of archived technical publications.
PUBLICATIONS 2006
SPIE Photomask Technology Conference 2006
Mask repair using layout-based pattern copy
for the 65-nm node and beyond
Improved prediction of Across Chip Linewidth Variation (ACLV)
with photomask aerial image CD metrology
Process window enhancement for 45 nm node
using alterable transmission phase shifting materials
Photomask Japan 2006
First results for hyper NA scanner emulation on AIMS 45-193i
Extended process window using variable transmission PSM materials for the 65nm and 45nm node
SPIE Microlithography 2006
Printability study with polarisation capable AIMS fab 193i to study polarisation effects
An advanced study for defect disposition through 193nm aerial imaging
EMLC 2006
Printability study with polarisation based AIMS fab 193i to investigate mask polarisation effects
Recent application results from the novel e-beam based mask repair system MeRiT MG
PUBLICATIONS 2005
Photomask Japan 2005
Advances with the new AIMS fab 193 2nd generation:
A system for the 65nm node including immersion
SPIE Microlithography 2005
Advances in hardware, software and automation for 193nm aerial images measurement systems
EMLC 2005
Application results at 193nm lithography emulation by aerial imaging and supplementery high resolution measurements
Application data of the electron beam based photomask repair tool MeRiT MG
PUBLICATIONS 2004
BACUS Photomask Technology 2004
Aerial image measuring system at 193nm: A tool to tool comparison and global CD mapping
Evaluation of printability of chrystal growth defects in a 193nm lithography environment using AIMS
AMT China 2004
Using the aerial image measurement technique to speed up mask developent for 193nm immersion and polarisation lithography
Photomask Japan 2004
Aerial image measurement technique for Automated Reticle Defect Disposition - ARDD - in wafer fabs
Demonstration of damage-free mask repair using electron beam-induced processes
SPIE Microlithography 2004
Immersion Mask Inspection with hybrid-microscopic systems at 193nm
Aerial image measurement technique for fast evaluation of 193nm lithography mask
EMC 2004
Aerial image measurement technique for today´s and future 193nm lithography mask requirements
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Publications 2006
Publications 2005
Publications 2004
Publications 2005
Publications 2004
Publications 2004
