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| Cost-efficient Mask Monitoring |
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Galileo is a high speed, high resolution DUV metrology tool, which offers a new way to IC manufacturers and mask makers for Critical Dimension (CD) Uniformity monitoring by photomask
transmission measurement.
Galileo measures mask CD Uniformity in the Wafer Fab for:
- Incoming mask qualification
- CD Uniformity monitoring
Galileo provides input for scanner exposure corrections based on mask CD uniformity signature (e.g. ASML Dose Mapper) to keep the CDU stable for better wafer yield
Galileo offers:
- Highest sensitivity to mask transmission changes within the mask and over time
- Early warning for wafer yield losses that are related to mask CD Uniformity changes
- High throughput allowing for frequent
monitoring
- Low Cost-of-Ownership & small footprint
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