mask_inspection
Technical Data Overview
Optics
Wavelength: 193 nm,
Numerical aperture (NA) range: 0.60 - 0.92 in 0.01 steps,
Sigma aperture range: 0.25 - 1.00 in 0.01steps

Illumination
Light source: ArF excimer laser
System Laser Class: Class 1
Off-axis patterns: Annular (1:3, 2:3, 1:2), quadruple, quasar, dipole and customer specific designs

Cameras
Overview video CCD camera: 1/3" CCD 752 x 582 pixel DC 12 V/1.4 W
UV sensitive cooled CCD array: 1317 x 1035 pixel, pixel size 6.8 x 6.8 µm, 12 bit gray level resolution

Monitor
18" High resolution flat panel

Scanning stage
Travel range in x/y: 240 x 230 mm
Resolution (maximum): 100 nm
Mask holder: 5", 6", 7" and 9"

Masks
Sizes: 5" (90 mil), 6" (120 mil, 250 mil), 7" (250 mil), 9" (350 mil) and 230mm (9mm)
Types: BIM, PSM, OPC and combinations thereof, with or w/o pellicle

Environment
Clean room conditions: ISO class 6 (Fed. Standard 209E class 1000) or better
Inside system: ISO class 3 (Fed. Standard 209E class 1)

Handling
Robot: Edge grip robot on a track, library for up to 3 different end-effectors
Load stations: SMIF interface for different sizes, Reticle box loader incl. bare mask loader

Power
Voltage: 120 V 3p, 230V 1p
Frequency: 60 Hz, 50 Hz
Power rating: 3500 W, 4000 W

Dimension
Width x depth x height (approx.): 2208 x 1410 x 2200 mm
Weight (approx.): 1400 kg

Connectivity
On request to major defect detection systems

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