See how it prints!
Aerial imaging is an optical technique that directly measures the image that will be formed in the focal plane of a stepper/scanner.
AIMS™ image of defective lines & spaces
By using equivalent optical exposure conditions for wavelength, numerical aperture, coherence and illumination type the AIMS systems are able to accurately emulate any given stepper, or scanner. The technique provides real time feedback on the lithographic performance of a photomask. Application of through focus measurements allows the user to additionally derive both de-focus exposure matrices and process latitude.
General Applications
- Performance evaluation and qualification of all types of lithographic masks (BIN, PSM and OPC)
- Defect printability checking and analysis
- Repair verification
- Prediction of expected resist linewidth after litho process
- Evaluation of phase errors based on CD predictions
- Incoming quality control
- Transmission analysis
- Wafer process optimization through direct variation of NA- and sigma-values
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 Innovative Features
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Aerial Imaging
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