Incoming reticle qualification
Repair verifications at given coordinates and performance tests at critical areas can be carried out easily. Actinic printability analyses can be performed at defect locations, detected by an automated inspection system.
- feedback to mask shops
- provide quantative
Ongoing reticle qualification
Lifetime monitoring of reticles and pellicles like monitoring of progressive defects is becoming increasingly important, especially due to degradation at the 193 nm wavelength. Furthermore, process verification of cleaned masks before and after pellicle mounting helps to prevent yield losses due to poor mask quality.
- minimize yield loss
Process engineering
Optimise your exposure tool settings. Test and improve your reticle enhancement techniques (RETs) such as optical proximity corrections (OPCs) and different kinds of off-axis illuminations (OAIs). Further phase shift masks (PSMs), even in combination with other RETs, can be analysed and optimised. All these tasks can be performed optically under scanner/stepper conditions in a very fast and easy way.
- speed up process development
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