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| Mask Repair/ Tuning |
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MeRiT® HR 32
E-beam mask repair system for high precision mask repair at 32nm and beyond |
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MeRiT® MG 45
E-beam mask repair system for high precision mask repair down to 45nm for every type of photomask. |
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CDC200™
System to control and improve Critical Dimension (CD) on photomasks |
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| Introduction |
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Photomasks exhibiting zero printable defects are essential for the manufacture of high yielding integrated circuits at the wafer fab. As feature sizes continue to shrink, so the demands and costs associated with these key optical elements raise exponentially and with them the necessity to repair defective product.
In recent years the e-beam based repair technology offered in the MeRiT® platform has become the de-facto standard in the repair of high end photomasks. The technique of using e-beam induced chemical reactions, specifically developed for advanced photomasks, combines both the superior focusing and non-destructive behaviour of the beam with the selectivity of the chemical reactions.
The MeRiT® platforms meet the requirements of today’s and future generations of binary and phase shift masks. Additionally, it is also a suitable technology for next generation lithography, such as EUV, or nano-imprint. |
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