mask_inspection Text: AIMS for Mask Shop

248 nm System
AIMS™ fab: Aerial Imaging for Mask Shop

Carl Zeiss AIMS™ fab, is a system to optically emulate steppers/scanners. The system quickly and accurately predicts with the help of new and innovative features the printability of all types of mask defects for every kind of reticle enhancement technique.


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The system can be used in the mask shop to speed up the development and production of a new generation of masks.
Innovative Features
Technical Data
Aerial Imaging
AIMS Video Tour


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