The E-Beam Mask Repair System is capable to repair opaque and clear defects on photomasks. A deposition for missing material of a mousebite-defect in a line and spaces pattern is shown here:
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The SEM image visualizes the lateral shape
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The AFM image indicates the height profile
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The AIMS™ image shows the feature printability onto the wafer, especially the VUV-transmission
For opaque defects, various etching process application modules are available, e.g. for Quartz, Chromium, Tantalum Nitride, Silicon Carbide, Molybdenum Silicide.
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