Save time in your mask repair cycle
The high precision stage allows to position the points of interest very accurately in the field of view. The displayed listing of defects allows to visit defect by a mouse click and it is also possible to compare defects before and after repair. Optionally, defect files can be imported from various automated reticle inspection tools or database systems.
Evaluation of phase errors on linewidths
Analysis of the through-focus behaviour of Phase-Shift Masks reveals information on phase errors due to their sensitivity on peak intensities and linewidth measures. This allows to correct the manufacturing process of the reticle.
Resist simulation
Further analysis can be performed by entering the aerial image data obtained by the AIMS™ fab into the resist simulation part of the software solid™_cr. Resist profiles and a simulated process window can be displayed simulating the exposure, post-exposure bake and resist development phases.
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