| | | | AIMS™ fab 193i wins prestigous IC Industry Award |
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| | The ZEISS mask qualification tool AIMS™ fab 193i wins the prestigious IC Industry Award 2006 in the category “Yield Management – Best Tool”. The prize was awarded in a ceremony during SEMICON West in San Francisco to the best products and processes in semiconductor business.
The AIMS™ fab 193i obtained more than 18.000 votes in the online voting. Dr. Oliver Kienzle, Member of the Board of Carl Zeiss SMS comments: „This is already the 2nd award in a row for our AIMS™ tool and we are very proud to have been rewarded by this entirely customer driven award. We develop every AIMS™ generation in close cooperation with our customers and the award confirms that we chose the right strategy.”
The award winning AIMS™ fab 193i is the first mask qualification system that enables emulation of both dry and immersion 193 nm lithography scanners with numerical apertures up to 0.93. It allows for analysing mask defects and verifying repair quality.
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Frank Averdung, Managing Director SMS and Dr. Axel Zibold, Director Sales and Service at the Award Ceremony in San Francisco
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