| Time | Topic | Speaker |
| 1:00pm | Registration |  |
| 1:15pm | Opening | Dr. Larry Hansen,
Carl Zeiss Japan Co. Ltd. |
| 1:45pm | Carl Zeiss Business Overview and Strategy | Frank P. Averdung,
Carl Zeiss SMS, Germany |
| 2:15pm | Approaching 45nm mask repair solution with MeRiT MG | Christian Ehrlich,
Carl Zeiss SMS, Germany |
| 3:15pm | Analysis of diffraction efficiency on AIMS 45-193i for advanced photomasks | Yasutaka Morikawa,
Dai Nippon Printing Co., Ltd. |
| 3:45pm | Coffee Break & Discussion | |
| 4:15pm | Exploring new field of AIMS application: Database related AIMS
measurements and global CD uniformity analysis | Hans van Doornmalen,
Carl Zeiss SMS, Germany |
| 5:00pm | Aerial image performance of hyper NA scanner emulator AIMS 45-193i
with polarization capability | Dr. Axel Zibold,
Carl Zeiss SMS, Germany |
| 5:45pm | Preview to new phase metrology tool Phame | Dr. Thomas Scherübl,
Carl Zeiss SMS, Germany |
| 6:30pm | Break and Moving to Banquet Room | |
| 6:45pm | Banquet | |
| 21:00pm | Closing | Frank P. Averdung
Carl Zeiss SMS, Germany |