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| High-Resolution Phase Metrology System |
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The Phame system measures and analyzes the phase-shift of high-end Phase Shift Masks (PSM). In addition to the conventional measuring of large scale reference features, Phame offers the ability to measure the much smaller production features on the mask used for printing the actual device features on the wafer.
The system captures so-called “real world mask effects” such as polarization, rigorous 3D mask-effects, diffraction, and more.
With its new capabilities the system allows for significantly improved process control in the mask design process and mask manufacturing.
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