MeRiT® MG 45 is the new generation e-beam mask repair system meeting the advanced requirements for the 45nm node.
The system is the only comprehensive system covering opaque and clear defect repair on both PSM and binary masks in one platform. It delivers damage-free repairs without staining or repair residues.
MeRiT® MG 45 enables high-end Mask Shops to produce defect-free photomasks with highest first pass yield.
Picture of the MeRiT® MG 45 system
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Principle
Software
System Setup
Technical Data
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