Photomask Japan 2009 is the 16th international symposium on photomasks and NGL masks in Japan. Carl Zeiss SMS will present its latest results in the field of mask qualification, mask repair & tuning, metrology and mask monitoring.
Donīt miss it!
| Place & Date | Presentations |
Wednesday 8 April
Poster Session, Repairing Tools and Technologies
4:00 - 6:30pm | Semi-automated Repair Verification of Aerial Images
 Dowload Abstract |
Thursday 9 April
Metrology Session,
4:40 - 5:00pm | Calibration strategies for precision stages in state-of-the-art registration metrology
Dowload Abstract |
Thursday 9 April
Session 10: Wafer Plane Inspection
1.00-3.00pm | Phase behavior through pitch and duty cycle and its impact on process window, Carl Zeiss SMS Jena / Germany, IMEC; Leuven /Belgium
Dowload Abstract |
 top |  Official Website
Conference
08-10 April, 2009
Place
Annex Hall, Pacifico Yokohama
Yokohama, Japan |