AIMS™ fab 193: Aerial Imaging for Mask Shop
Carl Zeiss AIMS™ fab 193 quickly and accurately predicts with the help of new and innovative features the printability of all types of mask defects for every kind of reticle enhancement technique.
 click to enlarge
The system is used in all major mask shop to speed up the development and production of a new generation of masks.
The current generation of AIMS™ Systems, the  AIMS™ fab 193i, meet the stringent requirements for advanced photomask evaluation for the 65nm node. AIMS™ fab 193i provides a linear polarisation capability in the illumination to investigate rigorous polarisation effects on the mask as well as an immersion option. | Innovative Features
Applications
Aerial Imaging
AIMS Video Tour
AIMS fab 193i
 Download Brochures |