Lithography
248nm, 193nm , 157nm, EUV, EPL, LEEPL
Node
Down to 45nm
Mask Holder
6" mask
SEM Column
Ultra-high resolution patented GEMINI® electron beam column featuring low voltage and variable pressure modes
End-pointing
High-sensitive SE detector and EsB detector implemented
Repair Application
Chrome, TaN, MoSi, SiC, Si- etching,
Pt/C deposition, other materials upon request
Repair function
Polygon shape, Scan rotation, Pattern copy,
Real-time imaging of deposition and etching
Minimum Repairable Defect
< 50nm
Resistance to chemicals
resistant to standard cleaning agents
Link with inspection tool
KLA file format, and others supported
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