mask_inspection
Technical Data Overview
Optics
Wavelength: 193 nm
Numerical aperture (NA) range: 0.60 - 0.92 in 0.01 steps
Sigma aperture range: 0.3 - 1.00 in 0.01steps

Illumination
Light source: ArF excimer laser
System Laser: Class 1
Off-axis patterns: Annular (1:3, 2:3, 1:2), quadruple, quasar, dipole and customer specific design

Cameras
Overview video CCD camera: 1/3" CCD 752 x 582 pixel DC 12 V/1.4 W
UV sensitive cooled CCD array: 1317 x 1035 pixel, pixel size 6.8 x 6.8 µm

Monitor
18" High Resolution Flat Screen

Scanning stage
Travel range in x/y: 240 x 230 mm
Resolution (maximum): 100 nm
Mask holder: 5", 6" and 7"

Masks
Sizes: 5" (90 mil), 6" (120 mil, 250 mil), 7" (250 mil) and 9" (350 mil)
Types: BIM, PSM, OPC and combinations there of, with or w/o pellicle

Power
Voltage: 190 V - 230V
Frequency: 50/ 60 Hz
Power rating: 2000 W on average,

Dimension
Width x depth x height: 800 mm x 790 mm x 770 mm
Weight: main system (base system): 700 kg, electronic rack: 110 kg

AIMS Software
Software operating under Windows NT.
Office version available.
System Control and Image Acquisition:
Selection of wavelength, illumination type, aperture control (NA and sigma), automated alignment capability, mask positioning including review capability, focus control, video autofocus, camera control, image capture, image normalization through clear field capture, single image mode and through-focus mode.

Data Analysis:
Intensity profiles, contour plots, linewidth versus threshold plots, linewidth versus defocus plots, exposure versus defocus plots, 3D intensity plot, histogram, 2 image comparison.

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