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| Advances in EUV Lithography |
| Carl Zeiss SMT ships EUV Optics for World’s First, 0.25 NA, Full Field EUV Alpha Tool by ASML | Downloads and Links | ||
| Milestone for new production technology for microchips reached. | RTF Documents
english (414 KB)Further Information 
Deutsche Version
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| OBERKOCHEN/Germany, 07.12.2005. Today, Carl Zeiss SMT has shipped the first optical system for an extreme ultra violet (EUV) lithography tool to ASML, the world’s leading provider of lithography systems for the semi- conductor industry. EUV is a next generation technology, based on 13 Nanometer illumination wavelength, which allows chip makers to print features sizes of 32 nm and below on integrated circuits. The EUV projection optics from Carl Zeiss SMT will be incorporated in the EUV Alpha demo tools. Unlike all lithography systems used in production today, the EUV projection optics fully consist of mirrors as there are no optical materials which are transparent for EUV. The light would just be absorbed. Requirements on these highly sophisticated EUV mirrors are exceptional. The asphericly curved surfaces of the reflective elements need to be produced with a contouring accuracy of only a few atoms; surface roughness may also not exceed a few atoms in order to precisely image the mask structures onto the wafer without blurs. The whole projection system, comprising six mirrors, positioned and adjusted with extreme accuracy, works in high vacuum since even minute amounts of residual gas would absorb the EUV radiation. The coatings of the mirror-substrates also plays a decisive role. Sufficient reflectivity can only be reached with a stack of more than 50 double-layers consisting of alternating layers of molybdenum and silicon (Mo/Si); each of these double-layers has a thickness of less than 10 nanometers. “Delivery of the first projection optics from Dr. Andreas Dorsel, Senior Vice President and General Manager of Carl Zeiss SMTīs Lithography Optics Divison explains: “EUVL ist most likely going to play a vital role in structuring future micro- chips. We are happy, to now reap the first results of our long lasting R&D efforts in this field. Delivery of the first optical system for ASMLīs EUVL alpha demo tool is an important milestone in the introduction of EUVL for mass production of ICīs.” Carl Zeiss SMT began research & development for EUV optics in mid-1990. To date, the company has invested more than 100 million EURO in basic research and production technology for the highly sophisticated mirror systems. The Federal Ministry of Education and Research (BMBF) has supported this development with more than State Secretary Prof. Dr. Frieder Meyer-Kramer (BMBF) remarks: “Electronics produces the highest known added value together with a hugely broadbased effect, benefiting practically all branches of technology. Lithography, especially EUV plays a decisive role in the further develop- ment of chip production, a meanwhile important economic industry for Germany. Optical systems for illumination and projection are the heart within the lithography machines. The shipment of the first full field EUV optics demonstrates the innovative strength of the German optical industry and its leading position in microlithography optics with respect to international competitors. This leadership will strengthen the prosperity of the micro- and nanoelectronics industry in Germany and contributing to save economic growth and employment in future”.  Principle of a mirror based EUVL projection optics. Markus Wiederspahn Carl Zeiss SMT AG Marketing Phone: +49 7364 20-2194 Fax: +49 7364 20-9206 E-Mail: 
wiederspahn@smt.zeiss.comNumber: 086/05 SE Number of Words: 609 Number of Characters: 4201 |
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