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| Carl Zeiss SMT Electron-beam Technology Takes Leap towards Nanotechnology | Downloads and Links | ||
| Important step towards becoming systems provider in nanotechnology enhances company’s profile | RTF Documents
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| OBERKOCHEN/Germany, 22.04.2004. Carl Zeiss SMT AG will expand its electron-beam technology efforts towards nanotechnology (Nanotechnology Systems Division). The business, which previously operated under the name LEO Elektronenmikroskopie GmbH, has been renamed Carl Zeiss NTS GmbH a wholly-owned subsidiary of Carl Zeiss SMT AG. “With this step we are completely integrating electron-beam technology into the Carl Zeiss SMT portfolio,” says Dr. Dirk Stenkamp, who continues in his role as President of Carl Zeiss NTS. "We expect many different synergies. The innovative power of electron beam technology will receive a clear boost under the aegis of SMT and at the same time will benefit from the worldwide image provided by the Carl Zeiss brand. SMT on the other hand will become a solution provider in the area of semiconductors and nanotechnology while continuously enhancing its product portfolio for its end-customer business,” continues Dr. Stenkamp. “All electron-beam, ion-beam and other analysis technologies, as well as applications in materials analysis, life sciences and semiconductor technology will be consistently sustained and expanded.” Carl Zeiss SMT AG President and CEO, Dr. Hermann Gerlinger emphasizes that “utilization of international distribution channels and the service network of the Nanotechnology Systems Division will deliver a strong synergy effect for selected products in the Semiconductor Metrology Systems Division – which will immediately benefit our customers.” Mask Repair System: Initial New Applications Already Winning Awards Carl Zeiss SMT is already one of the global market leaders in the manufacture of light optical systems for semiconductor production. The integration of electron beam technology adds a range of applications in the field of semiconductor manufacture. One of the first applications is the repair of photo masks for semiconductor lithography. The electron beam repair system which was developed for this application in co-operation with NaWoTec GmbH recently won the 2003 German Industry Innovation Award. The move towards becoming a systems provider with high-end products improves the initial situation for accessing the nanotech growth markets in the USA and Asia – China in particular. Furthermore, the extended range of innovative advanced technology enhances the company’s profile and the worldwide market position of Carl Zeiss SMT. It highlights the determination to continuously develop and systematically shape the future – an area where the use of new nanoimprint lithography technology plays a key role. Carl Zeiss SMT AG owns exclusive rights for European distribution of this technology. As a result, it is in a key position to disseminate this technology for lithography, initially for research, but in the future also for the industrial manufacture of nano structures. Markus Wiederspahn Carl Zeiss SMT AG Marketing Phone: +49 7364 20-2194 Fax: +49 7364 20-9206 E-Mail: 
wiederspahn@smt.zeiss.comNumber: 039/04 SE Number of Words: 440 Number of Characters: 2990 |
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