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| Starlith 1700i with NA=1.2 |
| Immersion Lithography Takes Next Step: Starlith® 1700i from Carl Zeiss SMT offers NA of 1.2 | Downloads und Links | ||
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| OBERKOCHEN/Germany, SAN FRANCISCO/California/USA, 13.07.2005. Today Carl Zeiss SMT has presented its new Starlith® 1700i lens for immersion lithography at 193 nm wavelength. Starlith® 1700i offers a Numerical Aperture (NA) of 1.2, by far the highest NA available in the market. It allows IC volume production at 45 nm design rules. The highest NA of 1.2 can be used over a field size of 26x33 mm. Catadioptric lens design The high NA is enabled by the proprietary “Catadioptric Inline Multi Mirror Design”, that enables a compact single barrel design. Since an even number of mirrors is used, there is no image flip, standard masks can be used as in all other systems. The proven coating technology of Carl Zeiss SMT allows for high light transmission in the system, thus facilitating high throughput in production. The system will be deployed in ASML´s new TWINSCAN™ XT:1700i, that has been introduced at Semicon West show 2005 too. New illumination system Alongside with the projection lens, the illumination system has been completely redesigned. The new AERIALTM XP illumination allows for efficient and flexible use of polarisation with excellent polarisation control, resulting in significantly enlarged process latitudes, especially for printing very small features. Dr. Hermann Gerlinger, President and CEO of Carl Zeiss SMT, said: “With this lens we have once more pushed the limits that had been imposed by previous generation technology, thus giving ASML´s customers substantial competitive advantage with respect to resolution, productivity and yield. That development re-emphasizes our joint lead together with ASML in the design and production of leading edge lithography systems for the chip industry.” Immersion Lithography – young but quickly evolving technology Back in Fall 2003, the very first full-field immersion lens, the Starlith® 1150i of Carl Zeiss SMT, was installed at an ASML immersion lithography system, the AT:1150i. Feasibility of immersion lithography was shown during the following months with the main advantage of an increase in depth of focus compared to the “dry” version, resulting in significantly enlarged process latitudes. Starlith® 1250i then was the first commercially available lens for immersion lithography, followed by Starlith® 1400i, the first high NA lens for IC series production with immersion technology. Thus Starlith® 1700i is the 4th generation of immersion lenses from Carl Zeiss SMT already and the first immersion lens with a hyper NA of 1.2. Markus Wiederspahn Carl Zeiss SMT AG Marketing Phone: +49 7364 20-2194 Fax: +49 7364 20-9206 E-Mail: 
wiederspahn@smt.zeiss.comPI Nr.: 053/05 SE Wortzahl: 395 Zeichenzahl: 2539 |
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