About us

Carl Zeiss SMT AG, Corporate Information

Life Sciences

Carl Zeiss SMT AG, electron microscopes for Life Sciences

Lithographic Systems

From 193 nm to 248 nm and up to 365 nm: Carl Zeiss SMT AG produces high-performance lithography optics for all exposure wavelengths currently used in the mass production of chips.

Material Analysis

Electron Microscopes for Material Analysis

Semiconductors

Products and solutions for the chip industry

Semiconductors / Laser Optics Division

laser and synchrotron optics

Careers

Make it to the top in the nano-age world

Company Facts

Facts and Figures

Laser Optics

Laser Optics

Management Board

Management Board

Optics for 193 nm

Starlith 900

Optics for 193 nm Immersion Lithography

Principles of Wafersteppers

Optics for 248 nm

Starlith 550 and 700

Optics for 365 nm

Starlith 400

Optics for EUV Lithography

Principles of Wafersteppers

Principles: Steppers & Scanners

Principles of Wafersteppers

Synchrotron Optics

Synchrotron optics

Technologies & Awards

Technologies & Awards

Terms of Purchase

Locations

Terms of Sale

Locations

The SMT Story

short history of Carl Zeiss SMT AG

1960 - 1979

Short history of Carl Zeiss SMT AG, 2006

1980 - 1989

Short history of Carl Zeiss SMT AG

1990 - 1999

Short history of Carl Zeiss SMT AG

2000 - 2003

Short history of Carl Zeiss SMT AG

2004

Short history of Carl Zeiss SMT AG, 2004

2004

Technologies & Awards

2005

Short history of Carl Zeiss SMT AG, 2005

2005

Technologies & Awards

2006

The SMT Story 2006

2006

Technologies & Awards

2007

The SMT Story 2007

Building the new semiconductor optics plant at Carl Zeiss

Building the new semiconductor optics plant at Carl Zeiss

Contact

How to contact Laser and Synchrotron Optics

CRISP Image Gallery - additional photos

image gallery - additional photos

CRISP image gallery - speakers

image gallery - speakers

CRISP Inauguration Ceremony

CRISP Inauguration Ceremony

Dresden_Gallery

Dresden Bildergallery

Electron Beam Technologies

Electron Beam Technologies

Entering the flat panel display market

Carl Zeiss SMT and Cymer launch a joint venture

Gallery2_Suppliers' Day

Singapore Image Gallery

Gallery_Peabody

Peabody Image Gallery

Gallery_Singapore

Singapore Image Gallery

Gallery_Suppliers' Day

Singapore Image Gallery

German Future Prize

Carl Zeiss SMT nominated for "German Future Prize 2007"

German Future Prize - Imagegallery

Carl Zeiss SMT nominated for "German Future Prize 2007"

German Future Prize - The Team

Carl Zeiss SMT nominated for "German Future Prize 2007"

Grand Opening Advanced Imaging Centre Singapore

Grand Opening Advanced Imaging Centre Singapore

Grand Opening Peabody

Grand Opening Carl Zeiss Nano Solutions Center Peabody

Grating Lab Reference List: Gratings for Space Projects

Grating Lab Reference list, Referenzliste Gitterlabor

High-Precision 3D Coordinate Measuring Machine M400

High-Precision 3D Coordinate Measuring Machine M400

Innovation_Center_Dresden

Innovation_Center_Dresden

List of Publications

List of publications: Grating lab and synchrotron optics

Ludwig-Erhard-Award

Ludwig-Erhard-Award 2007

Microscopy and Microanalysis 2007

Informationsseite zur Microscopy & Microanalysis 2007 in Fort Lauderdale, USA

Microscopy and Microanalysis 2008

Informationsseite zur Microscopy & Microanalysis 2008 in the USA

New plant, image gallery - April 2001

A ditch for the connecting passageway

New plant, image gallery - August 2001

Storage container for the sprinkler system

New plant, image gallery - December 2000

The Concrete Columns go up

New plant, image gallery - February 2001

Building more than usually stable foundations

New plant, image gallery - January 2001

Despite winter, the work proceeds

New plant, image gallery - July 2001

July 2001 - more progress on the building site

New plant, image gallery - June 2001

Making Progress

New plant, image gallery - March 2001

March 2001, putting the steel framework in place

New plant, image gallery - May 2001

The halls take shape

New plant, image gallery - November 2000

Erdarbeiten für den Neubau

New plant, image gallery - November 2001

View from the back

New plant, image gallery - October 2000

First ground broken for the most modern plant in the world for the production of lithography objective lenses

New plant, image gallery - October 2001

Connecting passway, north side

New plant, image gallery - September 2001

Carl Zeiss Family Day on the building site

Our competences in gratings

Gratings, our competences and attainable specifications

Our Vision

The Vision of the Carl Zeiss SMT AG

PR - Enabling Technologies for Nanostructuring

PR - Enabling Technologies for Nanostructuring

Publications EUV-Technology

Systeme für EUV-Lithographie

References: Gratings with Varied Line Spacing for Synchrotron Radiation

References: Gratings with Varied Line Spacing for Synchrotron Radiation

Semicon West 2007

Carl Zeiss SMT at Semicon West

Semicon West 2008

Carl Zeiss SMT at Semicon West

Semicon West Show

Semicon West Show

Semicon West: Image Gallery 1

Carl Zeiss SMT at Semicon West, Image Gallery

Supplier's Day

Supplier's Day 2007

Suppliers' Day 2008

Grand Opening Advanced Imaging Centre Singapore

Synchrotron optics - List of References

Synchrotron Optics - List Of References

Synchrotron Optics - our Competences

Synchrotron Optics, our competences