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Download | | Starlith® 1000
The market is demanding solutions which offer increased resolution on the basis of the 248nm wavelength, mainly because the overall costs of chip fabrication are significantly lower compared to 193 nm. Our answer: the development of the Starlith 1000 with an NA of 0.93 and a nominal resolution of 80 nm. The Starlith 1000 is used in the TWINSCANTM XT:1000 step & scan system from ASML. |
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Download | | Starlith® 870
The Starlith® 870 is already the sixth generation of DUV systems and is now the flagship at Carl Zeiss SMT for the 248nm exposure wavelength. More than 500 systems have been sold, making the Starlith® 870 one of the most successful lithography optical systems worldwide. The Starlith 870 is used in the TWINSCANTM XT:870G step & scan system and PASTM/870 from ASML. |
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