2003
Lithography Optics division utilizes the concept of immersion which is long proven in microscopy for enhancement of resolution and depth of focus. Based on the new lens design, business partner ASML develops the prototype of world´s first scanner for immersion lithography.
2003
The former Microelectronic Systems Division becomes Carl Zeiss SMS GmbH (Semiconductor Metrology Systems division). Focus is on the mask evaluation business with so-called AIMS tools.
2002
Delivery of the first lens produced in the new fab
2001
Inauguration of the new fab
2001
Carveout of Semiconductor Technology Group to form Carl Zeiss SMT AG
2001
Integration of LEO GmbH into the Semiconductor Technology Group
2000
Start of the construction of the new fab on the outskirts of Oberkochen
 |  2008
2007
2006
2005
2004
2000 - 2003
1990 - 1999
1980 - 1989
1960 - 1979
Awards |