Optics for 193 nm
			Starlith® 1400 Starlith® 1400, the latest lithography lens from Carl Zeiss SMT for 193 nm illumination wavelength enables volume production at a resolution of 65 nm. This means a size reduction of almost 10 percent over leading systems and is made possible by the unique lens numerical aperture (NA) of 0.93 (variable from 0.65 – 0.93) and its perfect image quality. Initial tests during integration of the lens at ASML demonstrated even 55nm resolution capability. Starlith® 1400: High-resolution Lithography Lens delivered
			Starlith™ 1250 Starlith™ 1250 is used in the TWINSCAN XT: 1250 B (for 200 mm wafer) and TWINSCAN XT: 1250 D (for 300 mm wafer) scanner from ASML respectively. Its numerical aperture, variable between 0.6 and 0.85, permits a resolution of 80 nm and below, with an image field of 26x33 mm. The illumination system can be set to various modes, thus offering ideal contrast, resolving power and depth of focus for each specific type of structure. Since the wavelength of 193 nm is very close to the absorption edge of quartz glass, single lenses made of artificial calcium fluoride are also used in the Starlith™ 1250 system.