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Carl Zeiss nominated for German Future Prize
In October, a team from Carl Zeiss was nominated for the German Future Prize – awarded by the German Federal President for technology and innovation – for the development of the EUV lithography used for the production of the microchips of the future.

Using extremely short-wave ultraviolet radiation, this technology will increase the performance of today's microchips in the coming years. This nomination in itself is a great success and confirms that major importance is attached to EUV lithography.

Dr. Peter Kuerz, spokesman of the team explains: "The nomination for the 2007 German Future Prize communicates a strong message to our market. This will help us to further increase and stengthen the acceptance of EUV lithography, the latest technology for the production of the high performance microchips of the future.

For more information, please see the press release.

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Links and Downloads
Information about:
The Team
EUV-Lithography
Image Gallery
German Future Prize
German TV Clips
Press Releases:
Carl Zeiss Team nominated for German Future Prize
Institutes with EUV-Tools:
Imec in Loewen (Belgium)
CNSE in Albany (USA)